This PhD work deals with characterization and electrical modeling of interconnection networks for 3D stacking of advanced integrated circuits. First, characterization tools have been developed for basic interconnect element specific of the 3D integration : ReDistribution Layer (RDL) interconnect, Back End Of Lines (BEOL) interconnect, Through Silicon Via (TSV) and Copper Pillar. Equivalent models are proposed and then validated on a broad band frequency (MHz-GHz) by electromagnetic modeling. An analysis of global electrical performances of interconnections networks is investigated for 3D wafer stacking. Face to Face, Face to Back and Interposer stacking are compared in order to establish their performances in term of data rate transmission. A study is also carried on 2D inductances integrated in the BEOL to find out which electrical performances are strongly impacted by the stacking of silicon substrate. The last part is dedicated to the optimization strategies of the 3D circuits performances in order to maximize their frequency bandwidth, to minimize the propagation delays and to insure the signal integrity (eye diagram). Answers are given to the 3D circuits designers for determining the best choices of chips orientation, routing and integration density. These results are valued on a concrete application of 3D circuits “memory on processor” (Wide I/O) where obtaining the required specifications on data rate (Gbyps) remain a real challenge.
