Confinement électrique et optique dans la filière GaAs : Ingénierie libre par oxydation sélective et reprise d'épitaxie

Due to the growing interest in VCSELs and the breadth of their application fields, VCSELs are evolving quickly to increase their integration capabilities and incorporate new features. This requires the control and the adaptation of the different technological steps such as the electrical and optical confinement engineering that often uses the selective wet oxidation of buried AlGaAs layers. The first part of this work was dedicated to the investigation of the mechanical stress/strain generated by the selective oxidation. This strain has a significant impact on the reliability and lifetime of the devices. In the second part of this thesis, we present a new planar approach of selective oxidation. The new technique is based on the oxidation of a buried AlGaAs layer through a matrix of nano-holes etched in a thin GaAs capping layer. This step is followed by an epitaxial regrowth to continue the structure stacking. Unlike the standard lateral oxidation, the shape of the oxidized areas can by freely designed. Moreover, this new approach increases the integration capability of the devices and provides a better heat removal and mechanical stability.