Transport properties and low-frequency noise in low-dimensional structures

Electrical and physical properties of low-dimensional structures have been studied for the various applications such as electronics, sensors, and etc. Low-frequency noise measurement is also a useful technique to give more information for the carrier dynamics correlated to the oxide traps, channel defects, and scattering. In this thesis, the electrical transport and low-frequency noise of low-dimensional structure devices such as multi-gate structures (e.g. FinFETs and Junctionless FETs), 3-D stacked Si/SiGe nanowire FETs, carbon nanotubes, and graphene are presented. From the view point of top-down and bottom-up approaches, the impacts of LF noise are investigated according to the dimensionality, conduction mechanism (surface or volume conduction), strain technique, and metal-semiconductor junctions.

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Source https://theses.hal.science/tel-00767284
Author Jang, Do Young
Maintainer CCSD
Last Updated May 30, 2026, 02:42 (UTC)
Created May 30, 2026, 02:42 (UTC)
Identifier NNT: 2011GRENT096
Language fr
Rights https://about.hal.science/hal-authorisation-v1/
contributor Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation (IMEP-LAHC) ; Université Joseph Fourier - Grenoble 1 (UJF)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP)-Institut National Polytechnique de Grenoble (INPG)-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Centre National de la Recherche Scientifique (CNRS)
creator Jang, Do Young
date 2011-12-05T00:00:00
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harvest_source_id 3374d638-d20b-4672-ba96-a23232d55657
harvest_source_title test moissonnage SELUNE
metadata_modified 2026-03-30T00:00:00
set_spec type:THESE