Plasma Etching of Poly(dimethylsiloxane): Roughness Formation, Mechanism, Control, and Application in the Fabrication of Microfluidic Structures

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Source ISSN: 1612-8850
Author Vlachopoulou, Maria-Elena, Kokkoris, George, Cardinaud, Christophe, Gogolides, Evangelos, Tserepi, Angeliki
Maintainer CCSD
Last Updated May 5, 2026, 14:08 (UTC)
Created May 5, 2026, 14:08 (UTC)
Identifier hal-00980549
Language en
contributor Institute of Microelectronics (NCSR "Demokritos", IAMPPNM) ; National Center for Scientific Research "Demokritos" (NCSR)
creator Vlachopoulou, Maria-Elena
date 2013-05-05T00:00:00
harvest_object_id c1ba18b2-998c-40a6-abca-de36aae3bf39
harvest_source_id 3374d638-d20b-4672-ba96-a23232d55657
harvest_source_title test moissonnage SELUNE
metadata_modified 2024-04-11T00:00:00
relation info:eu-repo/semantics/altIdentifier/doi/10.1002/ppap.201200008
set_spec type:ART