Plasma cryogenic etching of silicon: from the early days to today's advanced technologies
Data and Resources
Additional Info
| Field | Value |
|---|---|
| Source | ISSN: 0022-3727 |
| Author | Dussart, Remi, Tillocher, Thomas, Lefaucheux, Philippe, Boufnichel, Mohamed |
| Maintainer | CCSD |
| Last Updated | May 6, 2026, 00:49 (UTC) |
| Created | May 6, 2026, 00:49 (UTC) |
| Identifier | hal-00959819 |
| Language | en |
| contributor | Groupe de recherches sur l'énergétique des milieux ionisés (GREMI) ; Université d'Orléans (UO)-Centre National de la Recherche Scientifique (CNRS) |
| creator | Dussart, Remi |
| date | 2014-03-06T00:00:00 |
| harvest_object_id | ecf68fb0-cccc-4c93-b047-05f755e87bef |
| harvest_source_id | 3374d638-d20b-4672-ba96-a23232d55657 |
| harvest_source_title | test moissonnage SELUNE |
| metadata_modified | 2025-02-19T00:00:00 |
| relation | info:eu-repo/semantics/altIdentifier/doi/10.1088/0022-3727/47/12/123001 |
| set_spec | type:ART |