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Physico- chemical mechanisms involved in the silicon plasma etching cryogenic...
In microelectronic industries, silicon deep etching allows to obtain high aspect ratio structures (MEMS, MOEMS, vias, deep trench isolation...). Cryoetching is one of... -
Study and characterization of the properties of electromagnetic absorption of...
This thesis deals with an experimental and theoretical study of micro-structured silicon surfaces, obtained by processing in SF6/02 plasma at cryogenic temperatures.... -
Plasma cryogenic etching of silicon: from the early days to today's advanced ...
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