Quality and exposure control in semiconductor manufacturing. Part I: Modelling

17 pages

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Source ISSN: 0020-7543
Author Bettayeb, Belgacem, Bassetto, Samuel, Vialletelle, Philippe, Tollenaere, Michel
Maintainer CCSD
Last Updated May 25, 2026, 13:38 (UTC)
Created May 25, 2026, 13:38 (UTC)
Identifier hal-00677042
Language en
contributor Système d’Information, conception RobustE des Produits (G-SCOP_SIREP) ; Laboratoire des sciences pour la conception, l'optimisation et la production (G-SCOP) ; Université Joseph Fourier - Grenoble 1 (UJF)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP)-Institut National Polytechnique de Grenoble (INPG)-Centre National de la Recherche Scientifique (CNRS)-Université Joseph Fourier - Grenoble 1 (UJF)-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP)-Institut National Polytechnique de Grenoble (INPG)-Centre National de la Recherche Scientifique (CNRS)
creator Bettayeb, Belgacem
date 2012-05-25T00:00:00
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harvest_source_id 3374d638-d20b-4672-ba96-a23232d55657
harvest_source_title test moissonnage SELUNE
metadata_modified 2025-09-27T00:00:00
relation info:eu-repo/semantics/altIdentifier/doi/10.1080/00207543.2011.630042
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