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Wafer-scale fabrication of magneto-photonic structures in Bismuth Iron Garnet...
In this paper we report on a reproducible technological process for wafer-scale fabrication of different photonic structures in Bismuth Iron Garnet (BIG:... -
PMN-PT (lead magnesium niobate-lead titanate) piezoelectric material micromac...
International audience -
Physico- chemical mechanisms involved in the silicon plasma etching cryogenic...
In microelectronic industries, silicon deep etching allows to obtain high aspect ratio structures (MEMS, MOEMS, vias, deep trench isolation...). Cryoetching is one of... -
Coregistration of DSM and 3D Point Clouds Acquired by a Mobile Mapping System
Special Issue on Mobile Mapping Technology Full text is also available at http://ojs.c3sl.ufpr.br/ojs2/index.php/bcg/article/view/17002/11220 -
Iterative Closest Curve: a Framework for Curvilinear Structure Registration A...
International audience -
Kinetics of the plasma gas blowing refining process of silicon for solar cell...
The plasma refining process studied in this work can efficiently remove boron fromsilicon. In combination with other processes one can purify silicon for solar cells... -
Towards 3D lidar point cloud registration improvement using optimal neighborh...
International audience -
Co-registration of DSM and 3D points clouds acquired by a Mobile Mapping System
International audience -
Plasma etching and treatment of organosilicon material SiOC(H) by plasma for ...
This study concerns the plasma etching of hybrid materials SiOC(H) which are new emergent compounds. Their adjustable properties between organic and inorganic...
