This present work deals with the analysis and study of the integrated circuits behavior in CMOS technology under laser injection. An implementation methodology of a laser impact has been developed and optimized. The study has been focused on the development of a simulation tool integrating an electrical model of a laser impact on MOS transistor. This allows to reproduce in a qualitative way the behavior of a circuit under laser impact (semi-invasive attack on rear face of the circuit), whatever the physical properties of the laser.A preliminary study allowed us to calibrate a new electrical model and its use methodology based on the expected theory: photocurrent creation proportional to the applied potential on the drain junction and linked to the photoelectrical potential with the impacted area; triggering of the lateral parasitic bipolar transistors.The analysis of different complex circuits on silicon under different kind of laser beam allowed us also to validate the developed tool and its implementation methodology: it will help designers to prevent or predict such behavior of their circuits under laser attack, allowing them to find solutions of countermeasures and thus making their integrated circuits more robust in critical applications.
