Post Etch Plasma Treatments used for Porous...
URL: https://theses.hal.science/tel-00679654
Dataset description:
The decrease of the integrated circuits size lets to increase the performances and reduce the manufacture costs. However, this shrink causes the preponderance of interconnect...
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Additional Information
| Field | Value |
|---|---|
| Data last updated | unknown |
| Metadata last updated | May 24, 2026 |
| Created | unknown |
| Format | HTML |
| License | https://about.hal.science/hal-authorisation-v1/, info:eu-repo/semantics/OpenAccess |
| Created | 5 months ago |
| Id | 052e7121-a9be-4736-b1d7-ce7d53075c90 |
| Package id | oai-hal-tel-00679654v1 |
| Resource type | HTML |
| State | active |