About the key factors driving the resistivity of AuOx thin films grown by reactive magnetron sputtering
Data and Resources
Additional Info
| Field | Value |
|---|---|
| Source | ISSN: 0169-4332 |
| Author | Dolique, Vincent, Thomann, Anne-Lise, Millon, Eric, Petit, Agnes, Brault, Pascal |
| Maintainer | CCSD |
| Last Updated | May 6, 2026, 05:24 (UTC) |
| Created | May 6, 2026, 05:24 (UTC) |
| Identifier | hal-00952818 |
| Language | en |
| Rights | https://about.hal.science/hal-authorisation-v1/ |
| contributor | Groupe de recherches sur l'énergétique des milieux ionisés (GREMI) ; Université d'Orléans (UO)-Centre National de la Recherche Scientifique (CNRS) |
| creator | Dolique, Vincent |
| date | 2014-01-16T00:00:00 |
| harvest_object_id | 0315a2e0-cb44-4bc8-b004-23c2ca1628ff |
| harvest_source_id | 3374d638-d20b-4672-ba96-a23232d55657 |
| harvest_source_title | test moissonnage SELUNE |
| metadata_modified | 2024-06-04T00:00:00 |
| relation | info:eu-repo/semantics/altIdentifier/doi/10.1016/j.apsusc.2014.01.026 |
| set_spec | type:ART |