Atomic-scale silicon etching control using pulsed Cl-2 plasma
Data and Resources
Additional Info
| Field | Value |
|---|---|
| Source | ISSN: 0022-5355 |
| Author | Petit-Etienne, C., Darnon, Maxime, Bodart, P., Fouchier, M., Cunge, G., Pargon, E., Vallier, L., Joubert, O., Banna, S. |
| Maintainer | CCSD |
| Last Updated | May 6, 2026, 20:40 (UTC) |
| Created | May 6, 2026, 20:40 (UTC) |
| Identifier | hal-00944924 |
| Language | en |
| contributor | Laboratoire des technologies de la microélectronique (LTM) ; Université Joseph Fourier - Grenoble 1 (UJF)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS) |
| creator | Petit-Etienne, C. |
| date | 2013-05-06T00:00:00 |
| harvest_object_id | 6caab7b5-8472-4447-8d6d-c548ac79e089 |
| harvest_source_id | 3374d638-d20b-4672-ba96-a23232d55657 |
| harvest_source_title | test moissonnage SELUNE |
| metadata_modified | 2025-09-27T00:00:00 |
| relation | info:eu-repo/semantics/altIdentifier/doi/10.1116/1.4768717 |
| set_spec | type:ART |