Is actinometry reliable for monitoring Si and silicone halides produced in silicon etching plasmas?: A comparison with their absolute densities measured by UV broad band absorption

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Source ISSN: 1286-0042
Author Kogelschatz, M., Cunge, G., Sadeghi, N.
Maintainer CCSD
Last Updated May 6, 2026, 20:59 (UTC)
Created May 6, 2026, 20:59 (UTC)
Identifier hal-00944897
Language en
contributor Laboratoire des technologies de la microélectronique (LTM) ; Université Joseph Fourier - Grenoble 1 (UJF)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)
creator Kogelschatz, M.
date 2006-05-06T00:00:00
harvest_object_id 24c8a9a2-eb53-4837-b463-f2c65013af05
harvest_source_id 3374d638-d20b-4672-ba96-a23232d55657
harvest_source_title test moissonnage SELUNE
metadata_modified 2025-09-27T00:00:00
relation info:eu-repo/semantics/altIdentifier/doi/10.1051/epjap:2006021
set_spec type:ART