MD simulations of low energy Clx+ ions interaction with ultrathin silicon layers for advanced etch processes
Data and Resources
Additional Info
| Field | Value |
|---|---|
| Source | ISSN: 0022-5355 |
| Author | Brichon, P., Despiau-Pujo, E., Joubert, O. |
| Maintainer | CCSD |
| Last Updated | May 8, 2026, 06:04 (UTC) |
| Created | May 8, 2026, 06:04 (UTC) |
| Identifier | hal-00904425 |
| Language | en |
| contributor | Laboratoire des technologies de la microélectronique (LTM) ; Université Joseph Fourier - Grenoble 1 (UJF)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS) |
| creator | Brichon, P. |
| date | 2014-05-08T00:00:00 |
| harvest_object_id | a5b9f092-09d5-4f93-9720-207231f62cf5 |
| harvest_source_id | 3374d638-d20b-4672-ba96-a23232d55657 |
| harvest_source_title | test moissonnage SELUNE |
| metadata_modified | 2025-09-27T00:00:00 |
| set_spec | type:ART |