Stress-induced lift-off method for kerf-loss-free wafering of ultra-thin (∼50 μm) crystalline Si wafers

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Source Conference Record of the IEEE Photovoltaic Specialists Conference
Author Dross, Frédéric, Milhe, Aurélien, Robbelein, Jo, Gordon, Ivan, Bouchard, Pierre-Olivier, Beaucarne, Guy, Poortmans, Jef
Maintainer CCSD
Last Updated May 10, 2026, 06:45 (UTC)
Created May 10, 2026, 06:45 (UTC)
Identifier hal-00846861
Language en
contributor Interuniversity Microelectronics Centre (imec)
coverage San Diego, United States
creator Dross, Frédéric
date 2008-05-11T00:00:00
harvest_object_id 84229a49-2864-40a7-b528-e947724f4c9e
harvest_source_id 3374d638-d20b-4672-ba96-a23232d55657
harvest_source_title test moissonnage SELUNE
metadata_modified 2026-04-20T00:00:00
relation info:eu-repo/semantics/altIdentifier/doi/10.1109/PVSC.2008.4922741
set_spec type:COMM