Method for air gap interconnect integration using photo-patternable low k material
Data and Resources
Additional Info
| Field | Value |
|---|---|
| Source | https://hal.science/hal-00808852 |
| Author | Clevenger, L.A., Darnon, Maxime, Lin, Q., D. Lisi, A., V. Nitta, S. |
| Maintainer | CCSD |
| Last Updated | May 11, 2026, 15:57 (UTC) |
| Created | May 11, 2026, 15:57 (UTC) |
| Identifier | Patent N°: US 8,241,992 |
| Language | en |
| contributor | Laboratoire des technologies de la microélectronique (LTM) ; Université Joseph Fourier - Grenoble 1 (UJF)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS) |
| creator | Clevenger, L.A. |
| date | 2012-08-14T00:00:00 |
| harvest_object_id | fad5902f-fbdf-4bd7-b241-784336650bc9 |
| harvest_source_id | 3374d638-d20b-4672-ba96-a23232d55657 |
| harvest_source_title | test moissonnage SELUNE |
| metadata_modified | 2025-09-27T00:00:00 |
| set_spec | type:PATENT |