Atomic scale study of InP etching by Cl-Ar ICP plasma discharge
Data and Resources
Additional Info
| Field | Value |
|---|---|
| Source | ISSN: 1286-0042 |
| Author | Rhallabi, A., Chanson, R., Landesman, J.-P., Cardinaud, Christophe, Fernandez, M.-C. |
| Maintainer | CCSD |
| Last Updated | May 27, 2026, 14:37 (UTC) |
| Created | May 27, 2026, 14:37 (UTC) |
| Identifier | hal-00672785 |
| Language | en |
| Rights | https://about.hal.science/hal-authorisation-v1/ |
| creator | Rhallabi, A. |
| date | 2011-02-22T00:00:00 |
| harvest_object_id | 28aa970c-1103-4d25-904d-a64d881bf2ea |
| harvest_source_id | 3374d638-d20b-4672-ba96-a23232d55657 |
| harvest_source_title | test moissonnage SELUNE |
| metadata_modified | 2021-02-04T00:00:00 |
| relation | info:eu-repo/semantics/altIdentifier/doi/10.1051/epjap/2010100056 |
| set_spec | type:ART |