Low temperature, fast deposition of metallic titanium nitride films using plasma activated reactive evaporation
Data and Resources
Additional Info
| Field | Value |
|---|---|
| Source | ISSN: 0734-2101 |
| Author | Montes de Oca - Valero, Arturo Javier, Le Petitcorps, Yann, Manaud, Jean-Pierre, Chollon, G., Carrillo Romo, F. J., López M., A. |
| Maintainer | CCSD |
| Last Updated | May 10, 2026, 12:55 (UTC) |
| Created | May 10, 2026, 12:55 (UTC) |
| Identifier | hal-00083959 |
| Language | en |
| contributor | Institut de Chimie de la Matière Condensée de Bordeaux (ICMCB) ; Université de Bordeaux (UB)-Institut Polytechnique de Bordeaux-Institut de Chimie - CNRS Chimie (INC-CNRS)-Centre National de la Recherche Scientifique (CNRS) |
| creator | Montes de Oca - Valero, Arturo Javier |
| date | 2005-05-10T00:00:00 |
| harvest_object_id | 48ad0899-89c8-4783-95c3-e56589af626a |
| harvest_source_id | 3374d638-d20b-4672-ba96-a23232d55657 |
| harvest_source_title | test moissonnage SELUNE |
| metadata_modified | 2025-11-23T00:00:00 |
| relation | info:eu-repo/semantics/altIdentifier/doi/10.1116/1.1874152 |
| set_spec | type:ART |