Process simulation for advanced stress and junction engineering

Part I: Introduction: Challenge and solution for downscaling Part II: Process simulation ? Part III: Recent progress in the modeling of stress Part IV: Recent progress in the modeling of junction engineering Part V: Perspectives in Atomistic TCAD: towards some atomistic experiment ?

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Source https://cel.hal.science/cel-00667574
Author Krzeminski, Christophe, Lampin, Evelyne
Maintainer CCSD
Last Updated November 6, 2026, 15:52 (UTC)
Created November 6, 2026, 15:52 (UTC)
Identifier cel-00667574
Language en
Rights https://about.hal.science/hal-authorisation-v1/
contributor Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN) ; Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)
creator Krzeminski, Christophe
date 2008-09-15T00:00:00
harvest_object_id 23344f87-9940-4537-bd91-9c97955fa466
harvest_source_id 3374d638-d20b-4672-ba96-a23232d55657
harvest_source_title test moissonnage SELUNE
metadata_modified 2024-01-24T00:00:00
set_spec type:LECTURE