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Développement des techniques de scatterométrie en temps réel pour le suivi de...
The miniaturization of the semiconductor devices is made possible by the improvemen of technological processing steps (such as lithography, etching, etc.). This... -
Post Etch Plasma Treatments used for Porous SiOCH Materials Integration for I...
The decrease of the integrated circuits size lets to increase the performances and reduce the manufacture costs. However, this shrink causes the preponderance of...
