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Low‐Temperature & Transfer‐Free Graphene Growth: Process and Underlying Mecha...
In this thesis work, we developed a new paradigm in the field of graphene growth, based on PECVD and Ion Implantation techniques. Exposure of the metal film to highly... -
a-Si : H/c-Si heterojunction solar cells : back side assessment and improvement
Amongst available silicon-based photovoltaic technologies, a-Si:H/c-Si heterojunctions (HJ) have raised growing attention because of their potential for further... -
Development, characterization and modeling of interfaces for high efficiency ...
The interface between amorphous silicon (a-Si:H) and crystalline silicon (c-Si) is the building block of high efficiency solar cells based on low temperature... -
Low Temperature Plasma Synthesis of Nanocrystals and their Application to the...
International audience -
Low temperature plasma deposition of silicon thin films: From amorphous to cr...
International audience -
Thin crystalline silicon solar cells based on epitaxial films grown at 165 °C...
International audience -
XPS and NEXAFS characterisation of plasma deposited vertically aligned N-dope...
This paper is dedicated to carbon nanotubes grown by electron cyclotron resonance plasma-enhanced chemical vapour deposition. It has been shown that carbon nanotubes... -
Fabrication and characterization of silicon nanocrystals embedded in amorphou...
Due to their specific properties, silicon nanocrystals (Si-nc) embedded in dielectric matrix have recently attracted much interest for their use in silicon-based... -
Friction properties of ta-C and a-C:H coatings under high vacuum
The tribological behaviour of ta-C and a-C:H carbon films was analysed by pin-disc tests under high vacuum (<103 Pa). The tests were executed on a commercial High... -
Dual FCVA–PECVD deposition for DLC films
It is now well known that the filtered cathodic vacuum arc (FCVA) process produces ta-C films with good mechanical properties such as very high hardness. On the other... -
DLC films on LiTaO3 for SAW devices
In this work, we study the modification of the piezoelectric surface after immersion in a methane plasma, the adhesion of DLC films without a buffer layer and the... -
RBS-ERDA, XPS and XRD characterizations of PECVD tungsten nitride films
Tungsten nitride thin films are synthesized by plasma enhanced chemical vapor deposition using a hot wall type reactor. Amorphous and nanocrystalline W and W-N:H thin... -
Chemical bonding analysis of a-SiC : H films by Raman spectroscopy
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Interface study of PECVD hydrogenated silicon carbide coating on polypropylene
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