Plasma Etching of Poly(dimethylsiloxane): Roughness Formation, Mechanism, Control, and Application in the Fabrication of Microfluidic Structures
type: Distribution
access URL: https://hal.science/hal-00980549
format: HTML
issued: 2026-05-05T14:08:39.639262
modified: 2026-05-05T14:08:39.627784

test_moissonnage_selune
type: Agent

Plasma Etching of Poly(dimethylsiloxane): Roughness Formation, Mechanism, Control, and Application in the Fabrication of Microfluidic Structures
type: Dataset
contact point: Organization
  fn: CCSD
keyword: microfluidics
keyword: superhydrophobicphilic
keyword: physcondcm-msphysics-physicscondensed-matter-cond-matmaterials-science-cond-matmtrl-sci
keyword: journal-articles
keyword: infoeu-reposemanticsarticle
keyword: plasma-etching
keyword: polydimethylsiloxane-pdms
keyword: surface-roughness
landing page: 1612-8850
description: International audience
issued: 2026-05-05T14:08:39.637199
language: en
modified: 2026-05-05T14:08:39.637204