@prefix dcat: <http://www.w3.org/ns/dcat#> .
@prefix dct: <http://purl.org/dc/terms/> .
@prefix foaf: <http://xmlns.com/foaf/0.1/> .
@prefix vcard: <http://www.w3.org/2006/vcard/ns#> .
@prefix xsd: <http://www.w3.org/2001/XMLSchema#> .

<https://rec.harvest-normandie.data4citizen.com/dataset/oai-hal-hal-00975499v1> a dcat:Dataset ;
    dct:description "International audience" ;
    dct:identifier "hal-00975499" ;
    dct:issued "2026-05-05T15:57:50.418569"^^xsd:dateTime ;
    dct:language "en" ;
    dct:modified "2026-05-05T15:57:50.418573"^^xsd:dateTime ;
    dct:publisher <https://rec.harvest-normandie.data4citizen.com/organization/cce9db95-46d9-4dc2-84b6-764215d0a002> ;
    dct:title "Modeling of InP Etching Under ICP Cl2/Ar/N2 Plasma Mixture: Effect of N2 on the Etch Anisotropy Evolution" ;
    dcat:contactPoint [ a vcard:Organization ;
            vcard:fn "CCSD" ] ;
    dcat:distribution <https://rec.harvest-normandie.data4citizen.com/dataset/oai-hal-hal-00975499v1/resource/be2b1eff-f280-45be-9145-273b80f18f72> ;
    dcat:keyword "adsorption",
        "chlorine",
        "etching",
        "infoeu-reposemanticsarticle",
        "inp",
        "journal-articles",
        "modeling",
        "physcondcm-msphysics-physicscondensed-matter-cond-matmaterials-science-cond-matmtrl-sci",
        "plasma" ;
    dcat:landingPage <ISSN:%201612-8850> .

<ISSN:%201612-8850> a foaf:Document .

<https://rec.harvest-normandie.data4citizen.com/dataset/oai-hal-hal-00975499v1/resource/be2b1eff-f280-45be-9145-273b80f18f72> a dcat:Distribution ;
    dct:format "HTML" ;
    dct:issued "2026-05-05T15:57:50.424512"^^xsd:dateTime ;
    dct:modified "2026-05-05T15:57:50.408863"^^xsd:dateTime ;
    dct:title "Modeling of InP Etching Under ICP Cl2/Ar/N2 Plasma Mixture: Effect of N2 on the Etch Anisotropy Evolution" ;
    dcat:accessURL <https://hal.science/hal-00975499> .

<https://rec.harvest-normandie.data4citizen.com/organization/cce9db95-46d9-4dc2-84b6-764215d0a002> a foaf:Agent ;
    foaf:name "test_moissonnage_selune" .