Plasma cryogenic etching of silicon: from the early days to today's advanced technologies
type: Dataset
description: International audience
issued: 2026-05-06T00:49:42.366704
language: en
modified: 2026-05-06T00:49:42.366708
contact point: Organization
  fn: CCSD
keyword: black-silicon
keyword: cryoetching
keyword: cryogenic-etching
keyword: infoeu-reposemanticsarticle
keyword: journal-articles
keyword: low-k
keyword: physphysphys-plasm-phphysics-physicsphysics-physicsplasma-physics-physicsplasm-ph
keyword: silicon-deep-etching
landing page: 0022-3727

Plasma cryogenic etching of silicon: from the early days to today's advanced technologies
type: Distribution
format: HTML
issued: 2026-05-06T00:49:42.373083
modified: 2026-05-06T00:49:42.357031
access URL: https://hal.science/hal-00959819

test_moissonnage_selune
type: Agent