Titanium dioxide thin films deposited by pulsed laser deposition and integration in radio frequency devices: Study of structure, optical and dielectric properties
type: Dataset
description: International audience
landing page: 0169-4332
keyword: dielectric-permittivity
keyword: ellipsometry
keyword: infoeu-reposemanticsarticle
keyword: journal-articles
keyword: raman
keyword: surface-characterization
keyword: titanium-dioxide-pulsed-laser-deposition
issued: 2026-05-14T21:03:27.969324
modified: 2026-05-14T21:03:27.969333
language: en
contact point: Organization
  fn: CCSD

test_moissonnage_selune
type: Agent

Titanium dioxide thin films deposited by pulsed laser deposition and integration in radio frequency devices: Study of structure, optical and dielectric properties
type: Distribution
format: HTML
access URL: https://hal.science/hal-00781840
issued: 2026-05-14T21:03:27.972962
modified: 2026-05-14T21:03:27.938626