Dielectric oxynitride LaTiOxNy thin films deposited by reactive radio-frequency sputtering
type: Dataset
description: International audience
issued: 2026-05-20T05:43:03.726825
language: en
modified: 2026-05-20T05:43:03.726830
contact point: Organization
  fn: CCSD
keyword: chimmatechemical-sciencesmaterial-chemistry
keyword: epitaxy
keyword: infoeu-reposemanticsarticle
keyword: journal-articles
keyword: nitrides
keyword: permittivity
keyword: perovskites
keyword: sputtering
keyword: thin-films
landing page: 0040-6090

Dielectric oxynitride LaTiOxNy thin films deposited by reactive radio-frequency sputtering
type: Distribution
format: HTML
issued: 2026-05-20T05:43:03.768161
modified: 2026-05-20T05:43:03.702371
access URL: https://hal.science/hal-00693204

test_moissonnage_selune
type: Agent