test_moissonnage_selune
type: Agent

Atomic scale study of InP etching by Cl-Ar ICP plasma discharge
type: Dataset
contact point: Organization
  fn: CCSD
keyword: physphysics-physics
keyword: journal-articles
keyword: infoeu-reposemanticsarticle
keyword: physical-sciences
landing page: 1286-0042
description: International audience
issued: 2026-05-27T14:37:58.073651
language: en
modified: 2026-05-27T14:37:58.073656

Atomic scale study of InP etching by Cl-Ar ICP plasma discharge
type: Distribution
access URL: https://hal.science/hal-00672785
format: HTML
issued: 2026-05-27T14:37:58.090374
modified: 2026-05-27T14:37:58.064586