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Temperature influence on the production of nanodot patterns by ion beam sputt...
The temperature influence (T=300–625 K) on the production of nanodot patterns by 1 keV Ar+ ion beam sputtering (IBS) of Si(001) is addressed. The surface morphology... -
Quantitative magnetic imaging at the nanometer scale by ballistic electron ma...
International audience -
Blue light absorption enhancement based on vertically channelling modes in na...
International audience
