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Phase mask diffraction grating printing of extreme area and period
This PhD thesis presents a bench capable to write highly coherent diffraction gratings on a large area (potentially one square meter) with periods varying from 100 nm... -
Plasma etching and treatment of organosilicon material SiOC(H) by plasma for ...
This study concerns the plasma etching of hybrid materials SiOC(H) which are new emergent compounds. Their adjustable properties between organic and inorganic...
