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Performances of the negative tone resist AZnLOF 2020 for nanotechnology appli...
We present electron-beam lithography results on an AznLOF2020 UV negative tone resist. This study aims to define electron-beam lithography parameters compatible with... -
Evaluation of the dose deposited by electron beams in radiotherapy in voxeliz...
Radiation therapy treatment planning requires accurate determination of absorbed dose in the patient. Monte Carlo simulation is the most accurate method for solving... -
Transport line for a multi-staged laser-plasma acceleration: DACTOMUS
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