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Materials and anti-adhesive issues in UV-NIL
The UV curing nanoimprint lithography (UV-NIL) is a next generation lithography technique that can produce very tiny patterns (in the nanometer scale) by a simple... -
Legitimate domain of a Newtonian behavior for thermal nanoimprint lithography
International audience -
Epitaxie de nouvelles hétérostructures pour la filière GaAs : puits/boîtes qu...
Compound semiconductors provide a high flexibility in band structure engineering and cover a wide spectral band, meeting requirements for a large amount of...
